Instrument: |
Two SUSS Microtec MA150e full-field proximity aligners |
Contact: |
Lars.G.W.Tvedt@sintef.no
Lars.Breivik@sintef.no |
Booking: |
MiNaLab@sintef.no |
Sample Specifications: |
100 mm and 150 mm Si wafers with primary flat
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Technology Description: |
Maskaligners are used in photolithography to transfer a pattern on a photomask to a photoresist on a wafer. This photoresist can then serve as e.g. an etch mask to transfer the pattern into the wafer. The photoresist can also be removed after metal deposition, leaving a metal pattern on the wafer (lift-off). |
Technical Information: |
Contact Resolution: Pending on process, but resolution below 1 μm can be obtained.
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