Instrument: |
SUSS Gyrset RC8 spin coater |
Contact: |
Lars.Breivik@sintef.no |
Booking: |
MiNaLab@sintef.no |
Sample Specifications: |
100 mm and 150 mm Si wafers
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Technology Description: |
This tool is used for spin coating of a photo resist film on silicon wafers. This is the first step of a photolithography process. The thickness of the film is obtained by the result of the resist specifications (viscosity) and the chuck speed. |
Technical Information: |
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