Instrument: |
Mask Aligner MJB3 |
Contact: |
Mark Chiappa |
Technology Description: |
Maskaligners are used in photolithography to transfer a pattern on a photomask to a photoresist on a wafer. This photoresist can then serve as e.g. an etch mask to transfer the pattern into the wafer. The photoresist can also be removed after metal deposition, leaving a metal pattern on the wafer (lift-off). The resolution is far into the submicron region.This maskaligner is mostly used in student courses and is placed in the ISO7 area. Sample Specifications: Maskholders for 3″ and 4″ masks are available. |
Technical Information: |
Category: Lithography Area name: Student Lab Model: KSM MJB-3 HP Manufacturer: Karl Süss |
