Rapid Thermal Processing – One

Instrument:

Rapid Thermal Processing - One

Contact:

Viktor Bobal

Technology Description:

Material Class:

Si

Technology Description:

 

Annealsys Rapid Thermal Annealing furnaces use infrared lamp heating and can be used for various applications for silicon, compound semiconductor, photovoltaic, MEMS and other materials. Typical processes include implantation annealing, contact annealing, crystallization and densification. Rapid thermal oxidation and nitridation are also commonly performed.

Technical Information:

Ramp rate 50deg/s
  • 4” Single wafer chamber for Si

 

Technical Information:

Category: Thermal processes Area name: Clean Room Room area: 440 Model: AS-One Manufacturer: AnnealSys