Instrument: |
Centrotherm Diffusion furnace E 1550 HT 260-4 |
Contact: |
Lars.Breivik@sintef.no |
Booking: |
MiNaLab@sintef.no |
Sample Specifications: |
100 mm and 150 mm silicon substrates only
|
Technology Description: |
Thin film deposition by LPCVD (Low Pressure Chemical Vapour Deposition). |
Technical Information: |
2 LPCVD furnaces available for stoichiometric siliconnitride (Si3N4) deposition and polysilicon deposition respectively.Semi automatic loading system. |
