Instrument: |
Centrotherm Diffusion Furnace E 1550 HT 260-4 (horizontal furnace) |
Contact: |
Lars.Breivik@sintef.no |
Booking: |
MiNaLab@sintef.no |
Sample Specifications: |
100 mm and 150 mm Si wafers only
|
Technology Description: |
8 diffusion furnaces available for anneal, dry oxidation and wet oxidation at atmospheric pressure. |
Technical Information: |
7 quartz tubes and one SiC tube Loading system: Semi automatic Temperature:
Main gaslines:
Oxide thickness range: 20 nm to 3000 nm Thickness uniformity: ±3%. |
