Instrument: |
TePla plasma asher |
Contact: |
Martijn de Roosz
Mark Chiappa |
Technology Description: |
The TePla 300 Plasma asher can be used to strip off photo resist, descum or for cleaning of a wafer surface. Available process gases: O2, Ar, N2 Maximum power: 1000W |
Technical Information: |
Category: Dry etch Area name: Chemical area Model: TePla 300 Manufacturer: PVA |
TePla plasma asher
