MOVPE / MOCVD

Instrument:

MOVPE / MOCVD

Contact:

Vishnukanthan Venkatachalapathy

Technology Description:

Material Class: ZnO, ZnCdO, ZnMgO
Technology Description:

 

MOCVD (Metal-Organic Chemical Vapor Deposition) is a chemical vapor deposition method of epitaxial growth of materials, especially compound semiconductors from the surface reaction of organic compounds or metalorganics and metal hydrides containing the required chemical elements. The MOCVD at UiO MiNaLab is dedicated toZnO, ZnCdO, ZnMgO and related material systems.
Technical Information:  Titan (EMF) reactor

 

Technical Information:

Category: Epitaxy Area name: Clean Room Room area: 440 Model: Titan Reactor Manufacturer: EMF