Instrument: |
AMAT Endura HP PVD |
Contact: |
Erik.Poppe@sintef.no |
Booking: |
MiNaLab@sintef.no |
Sample Specifications: |
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Technology Description: |
The AMAT Endura is a highly sophisticated cluster tool with 4 deposition chambers, 1 backsputter/rf etch chamber, and 2 loadlocks with cassette-to-cassette handling. |
Technical Information: |
Sputter deposition of Au, NiCr, TiW, Al, Ti, and Pt. Other targets can be installed, but with some limitations on material compatibility with the lab.
Sputter-down on 150mm wafers. For other sample sizes, a Si wafer or a dedicated holder made of Al can be used. This holder must fit into a cassette, but by modifying the cassette holders thicker than standard can be used. |
