Instrument: |
MRC643, batch sputter deposition |
Contact: |
Erik.Poppe@sintef.no |
Booking: |
MiNaLab@sintef.no |
Sample Specifications: |
100 mm and 150 mm Si wafers, different chips depending on mounting
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Technology Description: |
The MRC643 is an ordinary sputter deposition tool, with DC magnetron configuration, or RF magnetron with limited power. The Ti target position has reactive gas possibilities for sputtering of TiN. |
Technical Information: |
Sputter deposition of Al, Ti, TiN(reactive) and W
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