Instrument: |
Microcluster for CSD PZT (solar-semi) |
Contact: |
Hannah.Tofteberg@sintef.no |
Booking: |
MiNaLab@sintef.no |
Sample Specifications: |
150 and 200 mm wafers
The samples must be able to withstand >600 °C. |
Technology Description: |
PZT realized through chemical solution deposition (CSD). CSD is a very versatile method as it provides excellent stoichiometry control and coverage of large surface areas. In this method a precursor solution of metal organics is deposited by spin-coating and dried/pyrolyzed. The resulting amorphous film is then crystallized after the desired thickness is reached.The application procedures used for CSD are quite similar to what is used in the semiconductor industry for application of photoresist today, which is a proven high throughput process. The difference between the two processes is the number of coatings necessary to achieve the total film thickness. |
Technical Information: |
Fully automated fabrication tool for piezo-ceramic films from chemical solutions. It consists of a specially adapter coater cluster, an RTP-furnace and the robotics for handling the wafers.Highlights of the automated CSD tool:
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