Lithography Wet bench

Technology Description:

Lithography bench

Manual wet station for applications where fume and liquid control is required. The wet benches are intended to support full wet chemical processing by using only construction materials that are compatible with strong acids, bases and solvents, as appropriate. Most of the conventional acids/bases are available, including HF.

There are four available spots on the two wet-benches, this is number  3.

See Info - Chemical list for Material Safety Datasheets (MSDS).