Instrument: |
Spin coater |
Contact: |
Mathilde Barriet
Trine Hjertås |
Technology Description: |
The spin coater may be used for coating, etching, cleaning, developing, rinsing/ drying of substrates and coatings. This single wafer spin processor is compatible with solvents, strong bases and acids.A substrate is loaded on to the chuck, vacuum hold-down is engaged from the control panel and the lid closed. The speed (100-8000 RPM), acceleration and time may be programmed. The bowl-shaped interior forces the fluid downwards, where it is routed directly to the rear drain. The chamber is equipped with a nitrogen purge. A 5 ml syringe with 4 different sized needles allows for manual or programmed control of dispense of fluids directly onto the substrate’s centre. |
Technical Information: |
Category: Chemical methods Area name: Chemical area Model: WS-400B-6NPP-LITE/ AS Manufacturer: Laurell Technologies |
