SEM

Instrument:

 FEI Quanta FEG 600 with EDAX

Contact:

 Anand.Summanwar@sintef.no

Booking:

 MiNaLab@sintef.no

Sample Specifications:

100 mm and 150 mm silicon wafers

  • Al/W/Ti
  • Glass
  • Polymers
  • Noble metals

Conducting samples are preferred.

Technology Description:

State of the art field emission microscope that allows nanometer level inspection of up to 150 mm wafers and other samples. The electron microscope images a sample by scanning it with a high-energy beam of electrons in a raster scan pattern. The electrons interact with the sample producing signals that contain information about the sample’s surface topography, composition, and other properties such as electrical conductivity.

Technical Information:

Quanta FEG 600 from FEI Company:

  • Back scatter detection
  • Secondary electron detection
  • Low vacuum (pressure < 2 mbar) and environmental SEM mode (pressure < 40 mbar) for non-conducting samples.
  • Electron beam induced current (EBIC).
  • Energy dispersive X-ray analysis (EDAX/EDX/EDS) for elemental analysis of the sample surface.