Tabletop Maskless Aligner for Optical Lithography – µPG 501
November 20, 2014

The newly installed Tabletop maskless aligner system for optical lithography brings a new level of flexibility to the optical lithography capabilities within NorFab. It is a versatile system that can prove valuable in a large range of different applications and research activities. Especially for prototyping such as structures for MEMS, Integrated Optics, Micro Fluidics, Lab-on-a-Chip devices and Photomask fabrication.

The traditional approach for optical lithography is the use of shadow masks. Using masks is an efficient way of producing large numbers of exposures, assuming you already have the mask available. Mask production can, however, be quite expensive and to be cost efficient relays on the exposure of a large number of wafers. When only a few exposures are needed a more direct approach is preferred. The µPG 501 expose pixel by pixel, by combining a high intensity light emitting diode (LED) at 390 nm with digital micro mirrors (DMD), thus avoiding the use of shadow masks. Furthermore, the pixel to pixel approach makes it possible to vary the intensity of the exposure to form 3D structures within the resist. The flexibility of the system makes it a very good choice for developing new designs that require testing, without having to produce shadow masks or when a small number of exposures are required.

The system is able to produce structures down to 1µm with a writing speed of 50 mm2 / min, thus covering more than 5 cm x 5 cm within one hour of exposure.

The system is located in the University of Oslo part of the Micro and Nanotechnology Laboratories (MiNaLab), and we welcome new users and projects to explore the possibilities this maskless approach brings.

 

Tabletop Maskless Aligner

Tabletop Maskless Aligner

Ring patterns

Ring patterns