Official opening of NTNU NanoLab’s new Elionix ELS-G100 EBL
January 4, 2016

Electron Beam Lithography is a key technique offered within NanoLab’s responsibility for nanolithography in NorFab. The old EBL system has been one of the most heavily used instruments in the cleanroom and over the last years it has constituted a severe bottleneck. The management at NanoLab were therefore thrilled to present the new state-of-the-art EBL from Elionix. The costs for the instrument will be covered by NTNU and the Research Council of Norway.

Some technical data for the new EBL:

• The Elionix ELS-G100 is a 100KV EBL system with a 100MHz pattern generator.
• The system has 2 SE and 1 BSE detectors, a height sensor to keep your sample in focus during exposure. In addition it has dynamic Focus and Stigmator adjustment to optimise beam shape at the edges of the field.
• Typical write field sizes at 100KV are 100µm, 250µm, 500µm, 1000µm. Larger write fields can be arranged after consultation with the responsible engineer if required.
• The beam diameter is 1.8nm at 100pA beam current is selectable up to 100nA.
• Sample sizes from 3X3 mm up to full 8″ wafers can be loaded and exposed We also have a cassete for Photo mask writing (further details below).
• The objective apertures are 60, 120 &240µm

Program

The opening of the EBL was celebrated with a half-day seminar of greetings, scientific presentations and lunch.