New Dry Etcher at NTNU NanoLab
April 30, 2014
NTNU NanoLab has recently had a new dry etcher installed, delivered by Oxford Instruments.
Specifications:
| Supplier: | Oxford Instruments Plasma Technology |
| Model: | Ionfab 300 plus (LC) (CAIBE) |
| 35cm RF ion source with 5kW power supply | |
| Wafer size: | Up to 4” (single wafer load-lock) |
| Temperature range: | 10°C – 300°C |
| Currently fitted with Ar and O2. Can be used with Cl2, BCl3 and other reactive gases to do both RIBE and CAIBE. |
