New Dry Etcher at NTNU NanoLab
April 30, 2014

NTNU NanoLab has recently had a new dry etcher installed, delivered by Oxford Instruments.

 

Specifications:

Supplier: Oxford Instruments Plasma Technology
Model: Ionfab 300 plus (LC) (CAIBE)
35cm RF ion source with 5kW power supply
Wafer size: Up to 4” (single wafer load-lock)
Temperature range: 10°C  – 300°C
Currently fitted with Ar and O2. Can be used with Cl2, BCl3 and other reactive gases to do both RIBE and CAIBE.