Location: Oslo
Cleanroom size: 440 m2
The UiO MiNaLab consists of one cleanroom floor and six laboratories with advanced synthesis, processing and analytical equipment, particularly suitable for semiconductors and material science. The facilities are hosted by the LENS group at Dept. of Physics, focusing on application-motivated basic research within semiconductor physics. The most essential research areas are solar cell technology, semiconductor nanoscience and -technology, MOEMS, wide bandgap semiconductors and transparent conductive oxides.
Website
UiO MiNaLab
Technologies and equipment at UiO MiNaLab
Thermal processes
- 3-zone furnace
- Big blue tube furnace
- Birkeland Tube furnace
- Flextura – Annealing chamber
- Lindberg Tube furnace
- Rapid Thermal Processing – Micro
- Rapid Thermal Processing – One
- Small blue tube furnace
- Tube 1 – 4-stack furnace
- Tube 2 – 4-stack furnace
- Tube 3 – 4-stack furnace
- Tube 4 – 4-stack furnace
- Warm cabinet
Thin film deposition
- Angstrom – E-beam and thermal PVD
- Atomic layer deposition (ALD)
- DC Magnetron sputtering
- Flextura – Magnetron sputtering chamber
- Flextura – Remote plasma chamber
- Leybold E-beam evaporation
- Moorfield – DC/RF Magnetron sputter
- MOVPE / MOCVD
- NanoPVD – DC/RF Magnetron sputter
- PECVD
- Semicore – DC/RF Magnetron sputter
- Thermal evaporator
