Rinse and dry STI Semitool

Instrument:

Rinse and dry STI Semitool

Contact:

Anh Tuan Thai Nguyen

Technology Description:

The Spin, Rinse and Dry (SRD) equipment from STI Semitool is an automatic machine for cleaning of wafers. It is capable of rinsing and drying Si wafers, GaAs wafers and masks. The three-stage SRD has the capability to clean up to 24 wafers each run. Fast and easy to use.

Technical Data: Handles up to 24 wafers each run.

Technical Information:

Category: Lithography Area name: Cleanroom Room area: 500 Model: STI Semitool Manufacturer: STI Semitool