Resist spinner

Instrument:

Resist spinner

Contact:

Viktor Bobal

Technology Description:

Material Class:

 

Technology Description:

 

Spin Coating is the standard method for applying photoresist coating to produce a thin uniform layer of photoresist on the wafer surface.

Technical Information:

Type: CEE 100

 

Technical Information:

Category: Lithography Area name: Clean Room Room area: 440 Model: CEE 100 Manufacturer: -