Mask aligner 2

Instrument:

Mask aligner 2

Contact:

Viktor Bobal

Technology Description:

Material Class:

 

Technology Description:

 

Maskaligners are used in photolithography to transfer a pattern on a photomask to a photoresist on a wafer. This photoresist can then serve as e.g. an etch mask to transfer the pattern into the wafer. The photoresist can also be removed after metal deposition, leaving a metal pattern on the wafer (lift-off).Soft and hard contact exposures give a resolution of 1-2 µm. Vacuum contact exposure give higher resolution (0,6 µm) but shortens the mask lifetime, whereas proximity exposures give lower resolution but less wear on the mask

Technical Information:

Type: Karl Suss MJB55

350 W mercury short-arc lam

 

Technical Information:

Category: Lithography Area name: Clean Room Room area: 440 Model: MJB55 Manufacturer: Karl Suss